Photolithography and sample preparation
Ultraviolet Ozone Cleaning System - UVOCS T10x10/OES
The UVOCS T10x10/OES Ultraviolet Ozone Cleaning System provides a simple, inexpensive and fast method of obtaining ultra-clean surfaces free of organic contaminants. This process is ideal when thin film deposition with excellent adhesion to the surface is required. Ultra-clean surfaces can easily be achieved by UV/Ozone processing in one to several minutes after the surface has been cleaned by conventional techniques.
Location
Electrical Engineering Cleanroom
Davis Hall, Suite 114
ÃÛÌÒ´«Ã½ North Campus
Buffalo, NY 14260
Fees
- Internal Academic: $25
- External Academic: $25
- Industry: $100
Ultraviolet Ozone Cleaning System - UVOCS T10x10/OES
For general inquiries, contact:
Donald J. Goralski
Director, Shared Instrumentation Laboratories
(716) 645-5151
For technical inquiries, contact:
Jeff Salzmann
Assistant Professor of Research, Cleanroom Manager
(716) 645-2584